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C171149 Plasmatherm SLR 720 PECVD / 720 RIE Reactive Ion Etch Deposition System

C171149 Plasmatherm SLR 720 PECVD / 720 RIE Reactive Ion Etch Deposition System

$65,000.00

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Product ID: C171149

Plasmatherm SLR 730 PECVD /720 RIE • Stand alone Dual chamber 720/720 Deposition & Etch system • PC controlled–windows based system • Plasmatherm 700 Aluminum body chamber • Load Lock Version with (2) two process modules • One PECVD • One RIE (Reactive Ion Etch) • Main body of system (shared components between the two chambers) includes • Stainless Steel Skins • Windows based PC controls • Advanced Energy RFPP - RF5S power supply (500W – 13.56MHz) • Advanced Energy AM5 matching network w/tuner • Leybold D25 or equivalent Load Lock pump • Neslab HX 75 chiller with RS232 interface to system • Electrical Disconnect box - 208V, 3 phase, 60amp • Flat panel display with keyboard & mouse • Full set of manuals • PECVD Module includes • Heated Chuck • Watlow controller • 11” chuck with center lift type • Optical Windows for Endpoint Control & diagnostics • Leybold D40 with 151 blower (min.) Mechanical pump • MKS 290 Ion Gauge controller and Ion gauge • MKS TC gauge controller • 1 or 2 Torr Baratron • 4 gas MFC’s • RIE module includes • Lower electrode • 11” showerhead • 11” chuck – center lift type • Optical Windows for Endpoint Control & diagnostics • Soffie Class III Laser endpoint detector • MKS 153 Throttle valve • Leybold 361C turbo pump • Leybold 150/360 NT turbo controller • Leybold D40BCS mechanical roughing pump • 500mT Baratron • 4 gas MFC’s Specification from a quotation when the University upgraded the system after the original purchase Gas Manifolds and Gas line fabrication and installation service • Fabricate & install (4) additional gas sticks/lines including Nupro valves, (with bypass valves included), unions, glands, VCR fittings, MFCs and gas manifolds in order to serve the existing Plasmatherm Dual Chamber PECVD/RIE System as listed below. • (2) - 4 port manifolds • (2) - gas sticks for Nitrogen and Argon to include nupro valve, mfc and "L" leg to gas connection • (2) - gas sticks with bypass (highly recommended for Cl2 and BCl3), to include 3 nupro valves and mfc • 2 - 4 channel valve control PCB (for the nupro valves) • 1/8" tubing for the nupro valves (~40 ft) • Re-wiring of the valve control PCB connectors to support this up-fit, plugs, pins and wire as necessary • JVIC will need to move the N2 purge inlet connection to its new location (to support the addition of the 4 port manifold • MFCs will be cleaned and calibrated to Nitrogen for the following flow rates • (2) for the PECVD side of the system • Nitrogen – 2000 sccm • Argon – 500 sccm • (2) for the RIE side of the system • BCL3 - 50 sccm • Cl2 – 50 sccm

Details

Plasmatherm SLR 730 PECVD /720 RIE • Stand alone Dual chamber 720/720 Deposition & Etch system • PC controlled–windows based system • Plasmatherm 700 Aluminum body chamber • Load Lock Version with (2) two process modules • One PECVD • One RIE (Reactive Ion Etch) • Main body of system (shared components between the two chambers) includes • Stainless Steel Skins • Windows based PC controls • Advanced Energy RFPP - RF5S power supply (500W – 13.56MHz) • Advanced Energy AM5 matching network w/tuner • Leybold D25 or equivalent Load Lock pump • Neslab HX 75 chiller with RS232 interface to system • Electrical Disconnect box - 208V, 3 phase, 60amp • Flat panel display with keyboard & mouse • Full set of manuals • PECVD Module includes • Heated Chuck • Watlow controller • 11” chuck with center lift type • Optical Windows for Endpoint Control & diagnostics • Leybold D40 with 151 blower (min.) Mechanical pump • MKS 290 Ion Gauge controller and Ion gauge • MKS TC gauge controller • 1 or 2 Torr Baratron • 4 gas MFC’s • RIE module includes • Lower electrode • 11” showerhead • 11” chuck – center lift type • Optical Windows for Endpoint Control & diagnostics • Soffie Class III Laser endpoint detector • MKS 153 Throttle valve • Leybold 361C turbo pump • Leybold 150/360 NT turbo controller • Leybold D40BCS mechanical roughing pump • 500mT Baratron • 4 gas MFC’s Specification from a quotation when the University upgraded the system after the original purchase Gas Manifolds and Gas line fabrication and installation service • Fabricate & install (4) additional gas sticks/lines including Nupro valves, (with bypass valves included), unions, glands, VCR fittings, MFCs and gas manifolds in order to serve the existing Plasmatherm Dual Chamber PECVD/RIE System as listed below. • (2) - 4 port manifolds • (2) - gas sticks for Nitrogen and Argon to include nupro valve, mfc and "L" leg to gas connection • (2) - gas sticks with bypass (highly recommended for Cl2 and BCl3), to include 3 nupro valves and mfc • 2 - 4 channel valve control PCB (for the nupro valves) • 1/8" tubing for the nupro valves (~40 ft) • Re-wiring of the valve control PCB connectors to support this up-fit, plugs, pins and wire as necessary • JVIC will need to move the N2 purge inlet connection to its new location (to support the addition of the 4 port manifold • MFCs will be cleaned and calibrated to Nitrogen for the following flow rates • (2) for the PECVD side of the system • Nitrogen – 2000 sccm • Argon – 500 sccm • (2) for the RIE side of the system • BCL3 - 50 sccm • Cl2 – 50 sccm

Additional Information

Buy on eBay https://www.ebay.com/itm/C171149-Plasmatherm-SLR-720-PECVD-720-RIE-Reactive-Ion-Etch-Deposition-System/293775030011?hash=item44665b36fb:g:nPMAAOSwWi5fkb6E
Depth (in inches) 77
Width (in inches) 53
Height (in inches) 84
Weight (in pounds) 4000.0000
Ships to Worldwide, excluding Africa, Middle East, South America
Item Location Gilroy, California, United States
Freight Contact us for details.

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Description

Details

Plasmatherm SLR 730 PECVD /720 RIE • Stand alone Dual chamber 720/720 Deposition & Etch system • PC controlled–windows based system • Plasmatherm 700 Aluminum body chamber • Load Lock Version with (2) two process modules • One PECVD • One RIE (Reactive Ion Etch) • Main body of system (shared components between the two chambers) includes • Stainless Steel Skins • Windows based PC controls • Advanced Energy RFPP - RF5S power supply (500W – 13.56MHz) • Advanced Energy AM5 matching network w/tuner • Leybold D25 or equivalent Load Lock pump • Neslab HX 75 chiller with RS232 interface to system • Electrical Disconnect box - 208V, 3 phase, 60amp • Flat panel display with keyboard & mouse • Full set of manuals • PECVD Module includes • Heated Chuck • Watlow controller • 11” chuck with center lift type • Optical Windows for Endpoint Control & diagnostics • Leybold D40 with 151 blower (min.) Mechanical pump • MKS 290 Ion Gauge controller and Ion gauge • MKS TC gauge controller • 1 or 2 Torr Baratron • 4 gas MFC’s • RIE module includes • Lower electrode • 11” showerhead • 11” chuck – center lift type • Optical Windows for Endpoint Control & diagnostics • Soffie Class III Laser endpoint detector • MKS 153 Throttle valve • Leybold 361C turbo pump • Leybold 150/360 NT turbo controller • Leybold D40BCS mechanical roughing pump • 500mT Baratron • 4 gas MFC’s Specification from a quotation when the University upgraded the system after the original purchase Gas Manifolds and Gas line fabrication and installation service • Fabricate & install (4) additional gas sticks/lines including Nupro valves, (with bypass valves included), unions, glands, VCR fittings, MFCs and gas manifolds in order to serve the existing Plasmatherm Dual Chamber PECVD/RIE System as listed below. • (2) - 4 port manifolds • (2) - gas sticks for Nitrogen and Argon to include nupro valve, mfc and "L" leg to gas connection • (2) - gas sticks with bypass (highly recommended for Cl2 and BCl3), to include 3 nupro valves and mfc • 2 - 4 channel valve control PCB (for the nupro valves) • 1/8" tubing for the nupro valves (~40 ft) • Re-wiring of the valve control PCB connectors to support this up-fit, plugs, pins and wire as necessary • JVIC will need to move the N2 purge inlet connection to its new location (to support the addition of the 4 port manifold • MFCs will be cleaned and calibrated to Nitrogen for the following flow rates • (2) for the PECVD side of the system • Nitrogen – 2000 sccm • Argon – 500 sccm • (2) for the RIE side of the system • BCL3 - 50 sccm • Cl2 – 50 sccm

Additional

Additional Information

Buy on eBay https://www.ebay.com/itm/C171149-Plasmatherm-SLR-720-PECVD-720-RIE-Reactive-Ion-Etch-Deposition-System/293775030011?hash=item44665b36fb:g:nPMAAOSwWi5fkb6E
Depth (in inches) 77
Width (in inches) 53
Height (in inches) 84
Weight (in pounds) 4000.0000
Ships to Worldwide, excluding Africa, Middle East, South America
Item Location Gilroy, California, United States
Freight Contact us for details.

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